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Tuning the Electronic Structure of Si1-xGex Alloys / Ngo, Ngoc Ha

Tác giả : Ngo, Ngoc Ha

Nhà xuất bản : H. : ĐHQGHN

Năm xuất bản : 2016

Tùng thư : Vol. 32;No. 4 (2016)

Chủ đề : 1. density functional theory. 2. electronic structure. 3. ground state. 4. Si-Ge alloy nanocrystals. 5. Article.

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Tóm tắt :

Binary alloys of Si1−xGex, where x is the Ge composition, have attracted much attention as functional materials of both micro-electronic and opto-electronic devices in recent years. In this study, we employ first-principles density functional theory (DFT) and k.p method to study ground states of the SixGe1-x (x = 0-1) alloys. In the systems, most physical properties of the indirect semiconductors are retained which are principally described by the ground states. An interesting property of Si1−xGex alloys that is their electronic band structures are tunable between those of bulk Si and Ge. The conduction band minimum of Si shifts gently from a point along ΓX path to the L point with the increased Ge composition x. The band structures of Si1-xGex alloys calculated by the k.p method are consistent with the results from DFT calculations. We also find that band topology changes along ΓL path yield various quantum transitions which may give rise to the changes of external quantum efficiency. The theoretical results provide comprehensive understanding for recent experimental observations on the shift of the absorption energy assigned to E1 direct transitions within L and Γ points in the Brillouin zone of Si1-xGex alloy nanocrystals.

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https://repository.vnu.edu.vn/handle/VNU_123/55496